Enhancement of Edge Exposure by Modified Photolithoeraphy Masks for Proximity Printing on Thick Resists
Original Publication Date: 1982-Sep-01
Included in the Prior Art Database: 2005-Feb-10
In the exposure of broad lines (much greater than Lambda) on thick resists, an overintensity at the edge can be desirable to obtain sufficient exposure at the bottom of the edge without having to strongly overexpose the top region of the lines everywhere. This overintensity is achieved by a suitable modification of the mask.