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Enhancement of Edge Exposure by Modified Photolithoeraphy Masks for Proximity Printing on Thick Resists

IP.com Disclosure Number: IPCOM000050182D
Original Publication Date: 1982-Sep-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue

IBM

Related People

Authors:
Courtens, E [+details]

Abstract

In the exposure of broad lines (much greater than Lambda) on thick resists, an overintensity at the edge can be desirable to obtain sufficient exposure at the bottom of the edge without having to strongly overexpose the top region of the lines everywhere. This overintensity is achieved by a suitable modification of the mask.