Browse Prior Art Database

Solvents for Photoresist

IP.com Disclosure Number: IPCOM000050282D
Original Publication Date: 1982-Oct-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue

IBM

Related People

Authors:
Schmitt, GP Shipley, JF [+details]

Abstract

A high boiling-point organic solvent, such as butyl CARBITOL*, is useful in developing photoimageable coatings based on epoxide-acrylate resin chemistry. Butyl CARBITOL does not dissolve acrylic photopolymers; however, diethyl CARBITOL solvent can be used to develop both acrylic and epoxide resin photopolymers, while not attacking that portion of the coating film which has been subjected to prior actinic radiation.