Browse Prior Art Database

Improved Ion Implant Emitter Process Disclosure Number: IPCOM000050296D
Original Publication Date: 1982-Oct-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue


Related People

Planck, RE Rozich, WR [+details]


This is a proposal for an ion-implant emitter process implementation which allows a sufficient amount of oxide remaining in contact areas to achieve compatibility with low barrier Schottky diodes to be used.