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Technique of Characterizing Calibration Grids in E-Beam Lithography Tools

IP.com Disclosure Number: IPCOM000050464D
Original Publication Date: 1982-Nov-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue

IBM

Related People

Authors:
Loughran, JF Michail, MS [+details]

Abstract

The non-ideal calibration grids employed to calibrate E-beam lithography tools are characterized by a filtering technique which improves the repeatability and accuracy of the grid parameters.