Practical Selective Epitaxial Process for Oxide Isolation
Original Publication Date: 1982-Dec-01
Included in the Prior Art Database: 2005-Feb-10
This article relates generally to processes for integrated circuit fabrication and more specifically to a selective epitaxial process for oxide isolation. The process includes steps for producing planar selective epitaxy which incorporates frontside gettering to improve epitaxial quality and for forming the epitaxy in a self aligned fashion such that the site can be opened repeatedly.