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Miniature Chuck Matching Fixture

IP.com Disclosure Number: IPCOM000050836D
Original Publication Date: 1982-Dec-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 2 page(s) / 77K

Publishing Venue


Related People

Messina, GP: AUTHOR [+2]


This article concerns an improved jig for use in aligning chucks of a lxx and 2xx Perkin Elmer exposure tool.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 66% of the total text.

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Miniature Chuck Matching Fixture

This article concerns an improved jig for use in aligning chucks of a lxx and 2xx Perkin Elmer exposure tool.

As shown in the figure, jig 1 includes a yoke 2 for mounting the jig on a wafer chuck 3. Additionally, jig 1 includes adjustment blocks 7A, 7B respectively attached to opposite ends of yoke 2. Blocks 7A, 7B are respectively provided with alignment ports 6A, 6B for receiving posts 5A, 5B, respectively, of a wafer pedestal positioned on the opposite side of chuck 3 (not shown). Jig 1 also includes adjustment screws 4A, 4B located in block 7A and adjustment screw 4C located in block 7B. Screws 4A, 4B and 4C are provided for adjusting the position of posts 5A, 5B and the associated wafer pedestal relative to yoke 2 and chuck
3. Finally, jig 1 includes springs 9A, 9B located in blocks 7A, 7B, respectively, for maintaining posts 5A, 5B in contact with adjustment screws 4A, 4B and 4C.

In operation, a wafer pedestal is first mechanically positioned on the front face of chuck 3 using feller gages such that the pedestal is centered in the chuck within a linear accuracy of approximately 0-005 inch and an angular accuracy of approximately
0.010 inch. Thereafter, jig 1 is attached to the back face of chuck
3. Next, an "initialization" wafer (a wafer having an alignment pattern thereon) is positioned on the pedestal and chuck combination.

The chuck and pedestal with the wafer mounted thereon is next loaded into a Perkin Elmer exposure t...