The following operators can be used to better focus your queries.
( ) , AND, OR, NOT, W/#
? single char wildcard, not at start
* multi char wildcard, not at start
(Cat? OR feline) AND NOT dog?
Cat? W/5 behavior
(Cat? OR feline) AND traits
Cat AND charact*
This guide provides a more detailed description of the syntax that is supported along with examples.
This search box also supports the look-up of an IP.com Digital Signature (also referred to as Fingerprint); enter the 72-, 48-, or 32-character code to retrieve details of the associated file or submission.
Concept Search - What can I type?
For a concept search, you can enter phrases, sentences, or full paragraphs in English. For example, copy and paste the abstract of a patent application or paragraphs from an article.
Concept search eliminates the need for complex Boolean syntax to inform retrieval. Our Semantic Gist engine uses advanced cognitive semantic analysis to extract the meaning of data. This reduces the chances of missing valuable information, that may result from traditional keyword searching.
Post-baking the photoresist stencil after development improves the smoothness of the niobium (Nb) edge surface which is to be the site of a Josephson junction.
English (United States)
This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
100% of the total text.
Page 1 of 2
Smoothness Control for Josephson Edge Junctions
Post-baking the photoresist stencil after development improves the
smoothness of the niobium (Nb) edge surface which is to be the site of a
In Nb edge junction devices, the Nb base electrode is plasma etched in CF(4)
+ O(2) to provide the tapered edge for tunnel barrier formation. The typical
etched surface exhibits a scalloped edge and rough surface. Because of this,
not only the total surface area can vary from junction to junction, but also the
Josephson current density, which depends on the local surface topology, may
vary. These factors can contribute to a random variation in zero voltage
maximum current density I(mo).
The smoothness of the Nb edge surface is improved by post-baking the
photoresist stencil after development. This is done prior to plasma etching at an
elevated temperature (e.g., at Approximately 150 degrees C for 10 to 30
minutes). The scalloping of the edge is eliminated and smoothness is improved
using the post-bake treatment (see comparative scanning electron micrographs
on the previous page), and the junction I(mo) spread is reduced.
Page 2 of 2
[This page contains 3 pictures or other non-text objects]