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Virtual Image Structure for Defining SubMicron Dimensions

IP.com Disclosure Number: IPCOM000051087D
Original Publication Date: 1982-Aug-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue

IBM

Related People

Authors:
Barbee, SG Goth, GR [+details]

Abstract

Minimum images, in the 0.5-2.0 Mum range, which are formed using current lithographic technology for semiconductor fabrication, typically exhibit poor tolerance (approx. +/- 40%). A proposal for the improved forming of micron or sub-micron images derived from one edge of a printed image is illustrated in Figs. 1-7. There the significantly reduced virtual image tolerance is principally determined by control of a thermal oxidation (approx. +/-5 percent).