Virtual Image Structure for Defining SubMicron Dimensions
Original Publication Date: 1982-Aug-01
Included in the Prior Art Database: 2005-Feb-10
Minimum images, in the 0.5-2.0 Mum range, which are formed using current lithographic technology for semiconductor fabrication, typically exhibit poor tolerance (approx. +/- 40%). A proposal for the improved forming of micron or sub-micron images derived from one edge of a printed image is illustrated in Figs. 1-7. There the significantly reduced virtual image tolerance is principally determined by control of a thermal oxidation (approx. +/-5 percent).