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Monitor Wafer for Etch End Point Detection

IP.com Disclosure Number: IPCOM000051401D
Original Publication Date: 1981-Jan-01
Included in the Prior Art Database: 2005-Feb-10

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Gallus, G Konrad, J Meyer, D [+details]


Precise control of etching processes (using sputtering or liquid etchants) requires an in situ determination of the etch end-points; some applications also require an in situ measurement of the film growth on previously etched surfaces.