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Cleaning Process for a Contaminated Vacuum System

IP.com Disclosure Number: IPCOM000051567D
Original Publication Date: 1981-Feb-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue

IBM

Related People

Authors:
Grivjack, S Scarafino, AJ [+details]

Abstract

Pumping manifold systems of backfill stations are used in various manufacturing applications, in particular, the manufacture of semiconductor products. On occasion, such manifold systems become contaminated with hydrocarbons, water and other gasses which have a very detrimental effect on the yield of the product. Conventionally, the technique for removing the contamination required the disassembly of the pumping station manifold lines, thoroughly cleaning with solvent, and re-assembling the lines. This was a very time-consuming, expensive, and tedious operation which took the manufacturing facility out of operation for long periods of time.