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Positive Photoresist for Permeation Etching

IP.com Disclosure Number: IPCOM000051731D
Original Publication Date: 1981-Mar-01
Included in the Prior Art Database: 2005-Feb-10

Publishing Venue

IBM

Related People

Authors:
Bergendahl, AS White, FR [+details]

Abstract

A positive photoresist suitable for permeation etching is provided by adding 0.1 to 10 percent imidazole to photoresists comprising a phenol-formaldehyde resin with a diazo-naphthoquinone sensitizer, for example, AZ1350 (product of Shipley Company).