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A silane adhesion promoter provides superior photoresist adhesion without the dewetting of the photoresist from the substrate.
English (United States)
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N, N Diethylaminotrimethyl Silane as an Adhesion Promoter for
A silane adhesion promoter provides superior photoresist adhesion without
the dewetting of the photoresist from the substrate.
N,N-diethylaminotrimethyl silane (TMSDEA) is deposited on a semi
conductor substrate prior to photoresist coating. The substrate surfaces which
are coated include silicon dioxide, silicon nitride, and polysilicon. TMSDEA
provides improved adhesion compared to other conventionally used adhesion
promoters, such as HMDS, and avoids the problem of dewetting of the resist
from the substrate which sometimes occurs with other silane adhesion
promoters. The TMSDEA can be vapor deposited as well as solution coated.