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An anode plate of quartz is coated with a layer of silicon to provide more uniform contact and a more uniform sputtered quartz layer deposition.
English (United States)
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Silicon Coated Anode Plate for Sputtering
An anode plate of quartz is coated with a layer of silicon to provide more
uniform contact and a more uniform sputtered quartz layer deposition.
A quartz plate is usually used as an anode, wafer-holding plate in floating-
mode sputtered SiO(2) deposition. The sputtered SiO(2) thickness uniformity is
affected by the resputtering potential established on the quartz plate. The
resputtering potential is in turn affected by, among other things, the anode of the
sputtering system and by the conditions of the contact between the quartz plate
and the anode. Any irregularities in the contacts will have adverse effects on the
SiO 2 thickness uniformity. However, a quartz plate with a coating of sprayed
Si (or other conductive material will minimize the adverse effects of non-uniform
contacts by providing a more uniform potential along the quartz plate surface.
The sprayed Si layer can be on the bottom side or top side (or both sides, if
desired) of the quartz plate.
The Si-coating, which is resistant to HF acide attack, also helps to prevent
the quartz plate from thickness loss during HF acid cleaning.