The InnovationQ application will be updated on Sunday, May 31st from 10am-noon ET. You may experience brief service interruptions during that time.
Browse Prior Art Database

Photoactive Polyimide

IP.com Disclosure Number: IPCOM000051888D
Original Publication Date: 1981-Mar-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue


Related People

Blakeslee, MC [+details]


Polyimide is a dielectric material used in the fabrication of microelectronic device structures. In order to form patterns or vias in it, a secondary photoresist mask or an intermediate metal mask (which is itself patterned by a photoresist mask) is required.