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Accurate Overlay between Patterns Written by E-Beam and Light Optical Lithography Systems Disclosure Number: IPCOM000051962D
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11

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Michail, MS Moore, RD [+details]


This is a technique for providing accurate overlay patterns by adjustin the field deflection of an E-beam system to match the field distortion of any optical system.