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Browse Prior Art Database

Accurate Overlay between Patterns Written by E-Beam and Light Optical Lithography Systems

IP.com Disclosure Number: IPCOM000051962D
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Michail, MS Moore, RD [+details]

Abstract

This is a technique for providing accurate overlay patterns by adjustin the field deflection of an E-beam system to match the field distortion of any optical system.