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Film Thickness Measurement Correction Disclosure Number: IPCOM000051968D
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11

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Case, WR Johnson, WE [+details]


Described is a technique for correction for different NA (numerical aperture) objective lenses when film thickness is measured by interferometric means through a microscope such as described by Fried, et al., in "Thickness Measurement of Silicon Dioxide Films Over Small Geometrics," Journal of Applied Physics 5732-5735 (November 1968).