Direct Readout Particle Detection System
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11
Conventionally, in order to quickly find particle contamination on blan wafers, a photograph was taken and then the light points would be counted on an image analyzer. Described is a new method to by-pass the photograph using a special 4-way illuminator system which produces uniform lighting. The light points of the particles on a semiconductor wafer are detected directly with a special plumbicon camera which integrates the image and then scans. The outputs of the particles are counted, and sized, and the location given on an output printer in less than one minute.