Sensitization of Diazo-Napthoquinone-Type Photoresists with Phenols
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11
The sensitivity of diazo-naphthoquinone positive photoresists to electr beams is increased when certain phenols are incorporated. For example, the following phenols, when added to the resist (concentration of phenol: 2% by weight of the solid content of the resist) were found to exhibit the sensitivity enhancement: 2-cyanophenol 3-cyanophenol 4-cyanophenol 3,5-dimethylphenol 2,3-dihydroxynaphthalene 0-aminophenol m-aminophenol 4-hydroxybenzaldehyde.