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Polymeric Donor Self Doped Acceptor Negative Resists

IP.com Disclosure Number: IPCOM000052087D
Original Publication Date: 1981-Apr-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Hofer, DC Kaufman, FB Kramer, SR [+details]

Abstract

The novel lithographic properties of negative resist compositions composed of polymeric donor films doped with added halocarbon acceptor molecules have previously been described (Tj. Weighed amounts of halo-carbon compounds, such as CBr(4), were cospun with the polymer to form negative resists that are high sensitive, high contrast and high resolution materials. Described here is an additional approach to these kinds of resists in which the polymer material contains a donor group and an acceptor group, both covalently bonded to the polymer chain. This configuration has several advantages from a lithographic point of view, relative to the earlier two-component systems.