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Sputtering Rate Monitor System

IP.com Disclosure Number: IPCOM000052135D
Original Publication Date: 1981-May-01
Included in the Prior Art Database: 2005-Feb-11

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Related People

Cistola, AB [+details]


The sputtering disposition rate of a sputtering system is monitored by the acoustic emission caused by the target particle impact on a quartz rod/piezoelectric transducer probe.