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The sputtering disposition rate of a sputtering system is monitored by the acoustic emission caused by the target particle impact on a quartz rod/piezoelectric transducer probe.
English (United States)
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Sputtering Rate Monitor System
The sputtering disposition rate of a sputtering system is monitored by the
acoustic emission caused by the target particle impact on a quartz
rod/piezoelectric transducer probe.
Acoustic probe 10 is a cylindrical rod of insulator material, e.g., quartz, and is
inserted and mounted into RF sputtering chamber C. A particle shield S prevents
excessive build-up of the deposition material M from target T on the
circumference of the probe 10.
Particles P of sputtered material M impacting the end face 11 of probe 10
transfer ultrasonic energy to it. Probe 10, acting as an acoustic waveguide,
transfers the ultrasonic energy out through a vacuum seal to a sensitive
piezoelectric transducer 12. The resonant frequency of transducer 12 is
compatible with the bandwidth of the noise or acoustic emission caused by
impacting particles P. The output of transducer 12 is fed to a conventional signal
When the electrical signal arrives at the amplitude discriminator 14, it is
separated out into various components depending on the amplitude of each
signal being sensed by the piezoelectric transducer 12. The discriminator 14
discriminates low amplitude acoustic emission due to particle P impact on the
probe 10 from high amplitude acoustic emission resulting from possible stresses
in the deposited film on the probe face 11. The discriminator 14 includes
memory circuits which allow the quantity of acoustic emission to be