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Alkali Etch Adhesion Promotion Process

IP.com Disclosure Number: IPCOM000052156D
Original Publication Date: 1981-May-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Kristoff, JS Nadeau, DP Walton, EG [+details]

Abstract

The adhesion of photoresist to silicon oxide surfaces is a factor of major importance in the manufacture of integrated circuits. The adhesion of typical, organic-based, photosensitive resists to SiO(x), (where 0