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System for the Uniform Deposition of Organic Polymers on Both Sides of Thin Substrates

IP.com Disclosure Number: IPCOM000052225D
Original Publication Date: 1981-May-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Wirtz, LH Yakubowski, C [+details]

Abstract

Substrates 5 to be coated are placed in the chamber 1 and remain stationary throughout the coating operation. The coating media is transferred from the reservoir 2 to the chamber 1 via a filter 7 by pressured nitrogen 4. When the substrates are covered, the solution is allowed to drain by gravity by opening valve 3, the rate being controlled by the orifice in the valve 6. The coating is accomplished without moving the substrates. After deposition is complete, the substrates can be removed for further processing.