Fabrication of Compact Josephson Edge Junction Interferometer
Original Publication Date: 1981-May-01
Included in the Prior Art Database: 2005-Feb-11
This article describes a Josephson Edge junction Interferometer structure that yields very compact devices and that can be fabricated in a process requiring fewer process steps. This is accomplished by a design which permits the definition of both the base electrode and the insulator in the same etching process provided that electrode and insulator materials of suitable etch rate are chosen. The interferometer can be fabricated as follows: - A suitable substrate is covered with the superconductor base electrode material S1 (e.g., Nb) and, thereafter, with an insulator (e.g., Nb(2)O(5) or Si). - After applying a photoresist layer, the desired pattern is written and developed. This results in the structure of Fig. 1. - In a suitable plasma (e.g.