Lens Accelerator for Medium and High Current Ion Implantation Systems
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
An arrangement is provided to overcome poor beam transport through an acceleration column at beam energies less than 10 OkV. This is achieved through use of an acceleration column such that the beam is accelerated from, for example, 35 kV to 105 kV in the first four gaps and, if a final voltage below 105 kV is desired, the beam is decelerated in the remaining gaps. If a final voltage greater than 105 kV is desired, then the beam is accelerated in the remaining gaps.