The InnovationQ application will be updated on Sunday, May 31st from 10am-noon ET. You may experience brief service interruptions during that time.
Browse Prior Art Database

Spot Overlap in a Variably Shaped Spot Electron Beam Exposure Tool

IP.com Disclosure Number: IPCOM000052352D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue


Related People

Quickle, RJ [+details]


By employing spot overlap in a variably shaped spot electron-beam expos lines may be written using fewer spots. This technique decreases the chip writing time, resulting in an increase in wafer throughput for designs which feature many diagonal lines.