Spot Overlap in a Variably Shaped Spot Electron Beam Exposure Tool
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
By employing spot overlap in a variably shaped spot electron-beam expos lines may be written using fewer spots. This technique decreases the chip writing time, resulting in an increase in wafer throughput for designs which feature many diagonal lines.