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Browse Prior Art Database

Spot Overlap in a Variably Shaped Spot Electron Beam Exposure Tool

IP.com Disclosure Number: IPCOM000052352D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Quickle, RJ [+details]

Abstract

By employing spot overlap in a variably shaped spot electron-beam expos lines may be written using fewer spots. This technique decreases the chip writing time, resulting in an increase in wafer throughput for designs which feature many diagonal lines.