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Technique for Editing Electron Beam Backscatter Signal for Distortion Disclosure Number: IPCOM000052517D
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11

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Ainsworth, RA Jackson, RD Michail, MS [+details]


In the process for exposing patterns using electron beam lithography it is necessary to perform periodic deflection calibrations so as to eliminate field distortions and to maintain pattern writing quality. This is normally done by collecting backscatter signal information while scanning a calibrated target and then processing the information to generate deflection corrections.