Reactive Surface Layer Formation using Surface Charging
Original Publication Date: 1981-Jun-01
Included in the Prior Art Database: 2005-Feb-11
A surface reaction process is described wherein reactive gas ions are used for compound or oxide formation, and a low energy (less than 100 electron volts) ion beam is directed at a surface for such compound or oxide formation. The degree of charging of the surface being bombarded is controlled by external electrical means, such as capacitor or R-C networks, connected to the workpiece.