Browse Prior Art Database

Methyl Alpha Trifluoromethkylacrylate an E Beam and UV Resist

IP.com Disclosure Number: IPCOM000052762D
Original Publication Date: 1981-Jul-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Ito, H Miller, DC Willson, CG [+details]

Abstract

Radiation-sensitive polymers have found wide use in minacroelectronic fabrication processes as resists. Poly (methyl methacrylate), PMMA, the most widely used E-beam and UV resist, possesses a number of desirable process characteristics, but lacks sensitivity sufficient to allow high production throughput. We have found that a structural modification of PMMA involving incorporation of a trifluoromethyl group results in a significant increase in sensitivity.