Browse Prior Art Database

Polyvinyl Alcohol as a Photoresist for Electron Beam Exposure

IP.com Disclosure Number: IPCOM000052802D
Original Publication Date: 1981-Jul-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Brown, KH Long, DT Srinivasan, R Webb, DJ [+details]

Abstract

A new positive photoresist for use in electron beam exposures has been developed.