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Method for High Speed Fabrication of Ultra Fine Structures

IP.com Disclosure Number: IPCOM000052810D
Original Publication Date: 1981-Jul-01
Included in the Prior Art Database: 2005-Feb-11

Publishing Venue

IBM

Related People

Authors:
Broers, AN Harper, JME Molzen, WW Pomerantz, M [+details]

Abstract

An earlier article [*] discloses the use of Langmuir-Blodgett films as an E-beam resist. The present article further discloses that this resist may be used without further processing after exposure to an electron beam.