UV Hardening of Resist Patterns
Original Publication Date: 1981-Aug-01
Included in the Prior Art Database: 2005-Feb-12
Precise control of the wall shape of resist patterns is required for microcircuit fabrication processes. We have found that UV-light irradiation onto resist patterns prevents thermal flows of the patterns which would have occurred without such treatment. The UV-exposure has to be carried out prior to any thermal or post-bake processes. With adequate amount of UV-light exposure to a medium pressure mercury lamp, the thermal flow of the resist patterns at 200 Degrees Celsius has been completely prevented.