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UV Hardening of Resist Patterns

IP.com Disclosure Number: IPCOM000052977D
Original Publication Date: 1981-Aug-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Hiraoka, H Pacansky, J [+details]

Abstract

Precise control of the wall shape of resist patterns is required for microcircuit fabrication processes. We have found that UV-light irradiation onto resist patterns prevents thermal flows of the patterns which would have occurred without such treatment. The UV-exposure has to be carried out prior to any thermal or post-bake processes. With adequate amount of UV-light exposure to a medium pressure mercury lamp, the thermal flow of the resist patterns at 200 Degrees Celsius has been completely prevented.