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Method for Producing Lithographic Structures Using High Energy Electrons

IP.com Disclosure Number: IPCOM000053010D
Original Publication Date: 1981-Aug-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Broers, AN Cuomo, JJ Krakow, W [+details]

Abstract

A process is provided for producing lithographic structures by using high energy electrons. It is used to prepare electron beam lithographic structures near atomic levels where only the high energy electron beam impinges. Extremely fine lines are obtained.