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Described herein is the inexpensive generation of large-scale masks for photolithographic and thin film printed circuit applications.
English (United States)
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Photocomposer Product of Masks for Thin Film Patterns
Described herein is the inexpensive generation of large-scale masks for
photolithographic and thin film printed circuit applications.
Mask generation for photolithographic processing is expensive and time
consuming. Special equipment is required to generate the precise images on
glass photographic plates.
As shown in the figure, large-scale mask generation can be accomplished
simply, rapidly and inexpensively with a computer controlled photocomposer
designed for text processing.
Simple software has been written to convert pattern data in some convenient
coordinate system to a form useable by the photocomposer. The photocomposer
exposes transparent film which, when developed, gives the desired mask
Such patterns have been successfully used to define metal evaporations on
Resolution is limited by that of the photocomposer, for example, about 30
micrometers. Although this resolution is not as great as that of some mask
generators, it is adequate for many applications, such as package parts. The
effective resolution may be increased by reducing optically the pattern during
resist exposure. Masks can be produced through this technology, allowing the
use of this process with large-scale dense package pieces or printed circuit
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