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This process describes the use of variable depth ion beam exposure to produce a mask pattern with selective transmission through quartz without a metal coating.
English (United States)
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Process for the Fabrication of Deep Ultraviolet Variable Transmission
This process describes the use of variable depth ion beam exposure to
produce a mask pattern with selective transmission through quartz without a
A polymer of photoresist film, with an optical density of 1.5 or greater, is
patterned selectively to form compensating transmission as a function of line
This mask overcomes the loss of intensity in typical masks, due to diffraction
effects especially in submicron geometries.
This is achieved by altering the thickness of the polymer/photo resist film
remaining in the exposed portion of the mask by selection of the ion species and
accelerating potential. This modulates the transmission of light in various line
widths defined in the polymer/photo-resist film after development.