Improves Meldrum Diazo Analogs for High Contrast Deep UV Lithographic Resist Systems
Original Publication Date: 1981-Sep-01
Included in the Prior Art Database: 2005-Feb-12
Meldrum's diazo and analogs (as indicated in I) are photoactive sensitive for deep UV (DUV) lithographic resist systems. We have now found a method of selecting derivatives of this sensitizer class that will uniquely provide enhanced image quality through greater differential solubility (R/R(0)).