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Improves Meldrum Diazo Analogs for High Contrast Deep UV Lithographic Resist Systems Disclosure Number: IPCOM000053166D
Original Publication Date: 1981-Sep-01
Included in the Prior Art Database: 2005-Feb-12

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Clecak, NJ Grant, BD Twieg, RJ Willson, CG [+details]


Meldrum's diazo and analogs (as indicated in I) are photoactive sensitive for deep UV (DUV) lithographic resist systems. We have now found a method of selecting derivatives of this sensitizer class that will uniquely provide enhanced image quality through greater differential solubility (R/R(0)).