Browse Prior Art Database

Ink Jet Nozzle Array Alignment Adapter Tool

IP.com Disclosure Number: IPCOM000053202D
Original Publication Date: 1981-Sep-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Bogardus, EH Hildenbrand, WW Horstmann, RE [+details]

Abstract

Patterns are re-created on silicon wafers by bringing a mask into contact with a photosensitive coating which has been applied to the wafer. Many such patterns must be aligned, one on top of the other during the processing steps. This precise alignment is done with a machine.