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Ink Jet Nozzle Array Alignment Adapter Tool Disclosure Number: IPCOM000053202D
Original Publication Date: 1981-Sep-01
Included in the Prior Art Database: 2005-Feb-12

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Bogardus, EH Hildenbrand, WW Horstmann, RE [+details]


Patterns are re-created on silicon wafers by bringing a mask into contact with a photosensitive coating which has been applied to the wafer. Many such patterns must be aligned, one on top of the other during the processing steps. This precise alignment is done with a machine.