Deep Ultraviolet Lithography Mask
Original Publication Date: 1981-Sep-01
Included in the Prior Art Database: 2005-Feb-12
A low reflectivity mask for deep ultraviolet lithography (200-300 nm) is fabricated from a film matrix containing a photoformed azo dye in a phenolic resin binder. Films of 1-2 Mu m thickness are cast on quartz plate blanks from an alkali insoluble phenolic resin such as para-octyl phenol containing 5-15% by weight of an azo dye precursor such as 2-diazo-1-napthoquinone-4-sulfonyl ester.