Browse Prior Art Database

High Speed, High Gain, Shallow Bipolar Devices

IP.com Disclosure Number: IPCOM000053632D
Original Publication Date: 1981-Oct-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Das, G Dumke, WP [+details]

Abstract

Thin glass films produced by oxidation of silane and diborane can act as an excellent source for doping boron into silicon.