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Precision Measurement Technique

IP.com Disclosure Number: IPCOM000053708D
Original Publication Date: 1981-Oct-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Denk, HH Powlis, J [+details]

Abstract

In the exercise of semiconductor technology, the generation and reproduction of precise geometrical shapes is a prime requirement. To meet this requirement, photographic image generation and subsequent reproduction by a wet or dry etching process is involved. For control, frequent measurements under a microscope at high magnification are required. The results of such measurements are highly dependent on optical resolution, illumination, focus, and subjective interpretation of these factors by the observer.