Precision Measurement Technique
Original Publication Date: 1981-Oct-01
Included in the Prior Art Database: 2005-Feb-12
In the exercise of semiconductor technology, the generation and reproduction of precise geometrical shapes is a prime requirement. To meet this requirement, photographic image generation and subsequent reproduction by a wet or dry etching process is involved. For control, frequent measurements under a microscope at high magnification are required. The results of such measurements are highly dependent on optical resolution, illumination, focus, and subjective interpretation of these factors by the observer.