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Exposing Photoresist on previously Patterned Substrates without using Masks

IP.com Disclosure Number: IPCOM000053774D
Original Publication Date: 1981-Nov-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Depp, SW Dewey, AG Marrello, V [+details]

Abstract

A method has been found for performing a photolithographic step without using a mask, but by using an optical technique which simultaneously senses the actual locations of the existing pattern and exposes the photoresist in accordance with that pattern. This technique is useful in situations where geometrical distortions of the substrate or patterns from previous processing make the use of conventional photomasks impossible.