High Resolution Method to Examine X Ray Resist Replica
Original Publication Date: 1981-Nov-01
Included in the Prior Art Database: 2005-Feb-12
This article describes a method to examine an X-ray contact resist replica by Transmission Electron Microscopy (TEM). TEM has a resolution capability better than 2 nm, and since the resist replica is capable of spatially discriminating differences down to 5 nm, any TEM is capable of seeing details in the replica. Furthermore, the common usage of TEMs in all laboratories makes the contact X-ray technique much more attractive.