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Negative Silicon Lift Off Technique

IP.com Disclosure Number: IPCOM000053848D
Original Publication Date: 1981-Nov-01
Included in the Prior Art Database: 2005-Feb-12

Publishing Venue

IBM

Related People

Authors:
Bergeron, RJ [+details]

Abstract

A method is described which uses a silicon barrier and a photoresist to form a negative or reverse image lift-off technique for providing on a substrate a separation between metal lines or lands having a distance of less than 60 microns.