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Any residual SiO(2) or quartz insulator which remains on the first level of metallurgy in a semiconductor can lead to device malfunction or failure.
English (United States)
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Procedure for Quartz Pattern Inspections
Any residual SiO(2) or quartz insulator which remains on the first level of
metallurgy in a semiconductor can lead to device malfunction or failure.
This residual insulator is very difficult to observe microscopically; however, it
can be easily made visible by the use of a water soluble azo or diazo dye
In practice, a water-soluble dye, such as the sodium salt of 1-diazo-2-
napthol-5-sulfonic acid dissolved to 10 wgt % in deionized water, is used. The
dye is spin coated onto the metal area over which an insulator had been coated
and subsequently removed by etching. The spin-coated dye layer of about 500
angstroms makes any residual insulator not properly etched away visible by
microscopic inspection. The removal of the imaging dye is accomplished by
using a water rinse.