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Acridine and Acridine Derivatives in Photoresist Mask Materials for High Resolution Microlithography

IP.com Disclosure Number: IPCOM000054085D
Original Publication Date: 1980-Dec-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Bassous, E Kaplan, LH Lin, BJ [+details]

Abstract

This article relates to the use of an absorptive additive in a photoresist which eliminates the need for a bandpass filter when used in conjunction with a preferred mercury source. More specifically, it relates to the use of acridine and acridine derivatives as an additive in photoresists to cause them to become opaque in the deep ultraviolet (UV) (200-260 nm) light region.