Browse Prior Art Database

Improved Cr-Zr Evaporation Source

IP.com Disclosure Number: IPCOM000054201D
Original Publication Date: 1980-Jan-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Bojarczuk, NA Oldakowski, CC Reith, TM Totta, PA [+details]

Abstract

Because chromium (Cr) has a high vapor pressure, it sublimes rather than evaporates when deposited as a diffusion barrier layer for integrated circuit metallurgy. Cr particulates are ejected from the source as a result of the sublimation process and can lead to a substantial yield loss due to interlevel shorting between first and second metal levels. The addition of another element, such as zirconium (Zr), to form a eutectic melt from which Cr evaporates preferentially, is a partial solution to the particulate problem since Cr now evaporates from the molten charge more controllably.