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Photoresist Development Control Which Is Independent of Fluctuations in Exposure Intensity

IP.com Disclosure Number: IPCOM000054244D
Original Publication Date: 1980-Jan-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Moritz, H [+details]

Abstract

During the manufacture of integrated circuits, semiconductor substrates coated with photoresist are exposed by means of a mask M. In the case of a positive photoresist, the exposed areas are chemically dissolved in a development process.