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Optical Measurement System Disclosure Number: IPCOM000054283D
Original Publication Date: 1980-Jan-01
Included in the Prior Art Database: 2005-Feb-13

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Engel, JM [+details]


This system automatically measures several key parameters relating to the layout of a semiconductor chip and the like that characterize the horizontal geometry of the lithography and provides extremely tight control of the tolerances of the lithography for producing the desired semiconductor device.