Browse Prior Art Database

Optical Measurement System

IP.com Disclosure Number: IPCOM000054283D
Original Publication Date: 1980-Jan-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Engel, JM [+details]

Abstract

This system automatically measures several key parameters relating to the layout of a semiconductor chip and the like that characterize the horizontal geometry of the lithography and provides extremely tight control of the tolerances of the lithography for producing the desired semiconductor device.