In Situ RIE/Ion Milling Process And Tool Configuration
Original Publication Date: 1980-Feb-01
Included in the Prior Art Database: 2005-Feb-13
Existing reactive ion etching processes have undesirable reaction by-products. These by-products are on or up to 75 monolayers deep into the wafer. The by-products result in undesirable material growths and constitute corrosion sources. A means for the safe removal of these undesirable reaction by-products is described herein.