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Programmable Photolithographic Masks

IP.com Disclosure Number: IPCOM000054431D
Original Publication Date: 1980-Feb-01
Included in the Prior Art Database: 2005-Feb-13

Publishing Venue

IBM

Related People

Authors:
Briska, M Hehl, W Schackert, K [+details]

Abstract

The generation of high resolution masks for photolithographic processes by light tables is time consuming, resulting in long turn-around times for changes and corrections. The flexibility and speed offered by electron-beam exposure has to be paid for by a complex overall system.