Masking Process For Magnetic Head Manufacture
Original Publication Date: 1980-Feb-01
Included in the Prior Art Database: 2005-Feb-13
This article describes a process for obtaining a planar structure in a magnetic read head. It involves: (a) Coating the surface of a substrate with a thick resist layer of about 2 micrometers and prebaking the coated assembly. (b) Aligning, exposing and developing the resist. (c) Sputter etching a layer of titanium/nickel-iron/titanium, which will serve as a readout data sensing layer. (d) Removing the resist and cleaning with a solvent. (e) Applying a thick overhang resist of about 4 microns, and prebaking. (f) Aligning and exposing and developing the resist. (g) Sputtering an insulating layer to match the thickness of the data sensing layers. (h) Lifting off excess insulator with ultrasonic agitation and acetone.